✽RHP200(XL) Rapid Thermal Processing System (RTP for Si, SiC, GaN)

Silicon carbide (optional: 6-inch or 8-inch conversion)
• Improved temperature uniformity, especially suitable for RTO processes or
  post-injection annealing
• RTO/Rs non-uniformity: RTO 0.53%, Rs 0.29%, 1σ
• Patented flat-pattern lamp array for optimal temperature control
• Specially designed bulbs for improved thermal efficiency