✽ Multi-size Single Wafer Cleaner

• Higher throughput: 12 cleaning tanks, 520 wafers/hour
• Minimal cleaning tank design
• Smaller footprint (10.4 square meters)
• Independent exhaust control
• Front-end line (FEOL) or back-end line (BEOL) cleaning
• Post-etch cleaning (DSP stripping)
• Pre/post-cleaning [hydrofluoric acid (DHF), SCI, O₃HF, HIPA, etc.]